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Film preparation conditions, film surface morphology and structure of the two kinds of materials are summarized.

总结了这两类材料的成膜条件 、 薄膜表面形态和结构以及它们的敏感特性.

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Moreover, many of these film preparation techniques are complex, expensive and difficult to control.

而且其中某些薄膜制备技术很复杂 、 成本高、很难控制.

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TiO _ 2 is often used as high refractive index material in optical thin film preparation.

在光学薄膜制备中,TiO_2是常用的高折射率材料.

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